AFM 기반의 초소형 PCD 공구를 이용한 표면 가공에 관한 연구

Abstract

Electronic devices, such as smart phones and LED (Light Emitting Diode) television, provide more functions in increasingly smaller and thinner sizes. Thus, the conducting lines for all electronic components are becoming finer. This study demonstrates precise nano scale patterning with an AFM (Atomic Force Microscopy) based PCD (Poly-Crystalline Diamond) tool on a PR (Photo Resist) and Cu deposited Si plate. The objective is to create more precise patterns, beyond the limits of existing electrochemical microscale processing, by using a mechanical machining process. AFM based micro patterning is carried out via a mechanical nano patterning process, TNL (Tribo-Nanolithography), on the coated surface made by spreading PR over sample. Thus, PR is locally removed by TNL. The case of Copper sample is created Copper deposited on Si plate surface by sputtering. And Cu is locally removed by TNL. The nano-pattern fabrication process is completed by removing the remaining chips from the Cu deposited surface. The fabricated pattern sample is used not only as a conducting line, but also as a precise electrode tool. The electrode tool created by these machining processes is mounted on a workpiece surface (Cu deposited Si plate) for electrochemical imprinting. The machining of precise nano-patterns via these processes will be applied to middle- or large-scale parallel electrode tool arrays for pulse electrochemical nano-imprinting.