전기화학적 방법에 의한 티타늄 임플란트 산화피막의 공정인자와 미세구조 특성에 관한 연구

Abstract

An anodic oxide film for dental implant on Ti plate has been fabricated by electrochemical method, and the characteristics of microporous Ti oxide film and rough morphology have been observed by SEM and energy dispersive spectroscopy analysis(EDS). The microporous oxide film for biomaterial applications was prepared by anodizing at constant voltage of 150 V in 1.2 M H2SO4+0.3 M H2O2 and 1.2 M H2SO4+0.3 M H3PO4 mixture solution. At the early stage of anodization the oxide film was uniform and less porous than that of the porous oxide film formed at higher voltage than 70 V of the anodizing process was led to increased gas evolution and also frequent sparking phenomena. For the effects of electrolytes on the microstructure of anodic film, the differents in the morphology and thickness of porous anodic films concerned mostly with the addition of H3PO4 acid. Identification of the phase of the formed anodic oxide film formed for 50 min in various solution was carried out using an XRD(Philips PW 1710). The crystallinity of the anodic oxide film was confirmed as an anatase containing rutile.