AFM 기반 Tribo-nanolithography 응용 미세패턴 가공에 관한 연구

Abstract

This paper demonstrated an atomic force microscopy (AFM)-based tribo-nanolithography (TNL) technique as a next-generation process for precision machining and micro-polycrystalline diamond tool fabrication, as a possible replacement for conventional optical lithography or beam lithography techniques. The TNL method, a simple, flexible, maskless process, offers great potential with regard to the future of environmental nanotechnology, in contrast to conventional semiconductor processes that use etchants and radiation. In this study, micro-/nano-patterning of various materials was conducted using the TNL method. The materials machined included not only brittle materials (e.g., silicon wafers) but also flexible materials (e.g., pulse electrochemical polished aluminum, deposited Al/Si substrates, and Cu/Si substrates from sputtering). In this process, three machine modes were identified with respect to the fabricated pattern shape and chip shape: ploughing mode, cutting mode, and brittle mode; these modes are well known in the nano-cutting industry. In an additional experiment, because the maximum machining ability of the TNL system depended on the nano-tool specification, a cooling stage was added to the TNL system. Minimizes the ductility with the surface of the Al / Si and Cu / Si through the cooling of the workpiece was increased width and depth of the pattern by changing the nature of the brittle. To accommodate mass production, polymeric material substrate imprints, such as polydimethylsiloxane stamps, can be replicated from TNL-produced master molds for fine-pattern replication via soft lithography, thus providing a low-cost, highly accurate printing technique. Additionally, the metal master mold fabricated with TNL can also be used as an electrode for electrochemical imprinting, with potential application to various fields related to nanotechnology.