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광 감도 비교를 통한 전자처리 스페클 패턴 간섭계의 최적 측정 조건에 대한 연구

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Author(s)
김현호
Issued Date
2014
Abstract
The Electronic speckle pattern interferometry is one of the optical nondestructive testing technique. Current, non-destructive inspection technology is using industrial machinery, nuclear power plants, heavy plant, shipbuilding ships, aircraft, cars in the field of safety diagnostic tests. One of the non-destructive testing techniques ESPI is best suited for the development and testing of complex components and structures in electronics, automobile design, machining and materials research. It is ideal for the experimental verification of analytical and numerical calculation techniques Purpose of study, by comparing the light sensitivity in measuring the plane deformation of an object, is to obtain the reliability of the out-of-plane deformation interferometer.
A study on the optimum conditions is compared the photosensitivity for ensure reliability to the comparison and verification through the Shearography. and Electronic Speckle Pattern Interferometry
Sherography system is a commercial one from Dantec Dynacmics, German (Q-800 model), and it is composed of shearography sensor, diode laser inside of sensor, controller, and PC. Amount of shear is given in Y direction as 5 mm (0.333mm/pixel), and system utilizes commercial program, ISTRA 4D, for equipment control and filtering/grain treatment.
In this paper, photosensitivity measurement interferometer using a Electronic Speckle Pattern Interferometry theory develope and verify through a comparative experiment of photosensitivity
Devices capable of determining the reference value develope and through the experiment, effective quantitative detection method offer
Using the test method proposed in this paper, the size of the internal defects, shape, check the position with high resolution inspect, the concept of quantitative non-destructive evaluation that is basis to product reliability, safety, health will meet. So laser speckle interferometry will be expected reliable non-destructive inspection
Alternative Title
A study on optimal measurement conditions of ESPI by comparing photosensitivity
Alternative Author(s)
Kim, Hyun Ho
Affiliation
첨단부품소재공학과
Department
일반대학원 첨단부품소재공학과
Advisor
김경석
Table Of Contents
목 차

LIST OF TABLES Ⅲ
LIST OF FIGURES Ⅴ
ABSTRACT Ⅵ

제 1 장 서 론 1
제 1 절 연구 배경 1
제 2 절 연구 목표 및 내용 3

제 2 장 이론적 배경 4
제 1 절 스페클 상관 간섭법 4
1-1. 스페클 형성과 크기 4
1-2. 스페클 상관 간섭무늬 8
제 2 절 물체의 변형정보 추출 12
2-1. 위상이동기법(Phase Shifting) 12
2-2. 결펼침(Unwrapping) 14
제 3 절 광학 간섭계 16
3-1. 면외 변위 측정간섭계(Out-of-plane) 16
3-2. 전단간섭계 17

제 3 장 실험장치 및 구성 18
제 1 절 면외 변형 측정 시스템 18
1-1. 광 감도 측정 시스템 18
1-2. ESPI System 21
1-3. Shearography System 23
1-4. 해석프로그램 25
제 2 절 시험편 29
2-1. 평판 시험편 29

제 4 장 실험결과 30
제 1 절 평판 시험편의 면외 변형 측정 결과 30
1-1. 광 감도에 따른 면외 변형 측정 30
1-2. 평판 시험편 면외 변형 비교 분석 36
1-3. 평판 시험편 분석 결과 45

제 5 장 결론 54

참 고 문 헌 55
Degree
Master
Publisher
조선대학교
Citation
김현호. (2014). 광 감도 비교를 통한 전자처리 스페클 패턴 간섭계의 최적 측정 조건에 대한 연구.
Type
Dissertation
URI
https://oak.chosun.ac.kr/handle/2020.oak/12079
http://chosun.dcollection.net/common/orgView/200000264628
Appears in Collections:
General Graduate School > 3. Theses(Master)
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